Doppler: DPL-aware and OPC-friendly gridless detailed routing with mask density balancing

Yen Hung Lin*, Yong Chan Ban, David Z. Pan, Yih-Lang Li

*此作品的通信作者

研究成果: Conference contribution同行評審

5 引文 斯高帕斯(Scopus)

摘要

The printed image of a layout that satisfies the double patterning lithograph (DPL) constraints may not have good fidelity if the layout neglects optical proximity correction (OPC). Simultaneously considering DPL and OPC becomes necessary when gene rating layouts, especially in routing stage. Moreover, one decomposed design with balanced mask density has a lower edge placement error (EPE)than an unbalance done[6]. This work proposes a compre-hensive conflict graph (CCG)to enable detailed routers to simultaneously consider DPL, OPC, and mask density to gene rate litho-friendly layouts. This work then develops an DPL-aware and OPC-friendly gridless detailed routing (DOPPLER) by applying CCG in a gridless routing model. A density variation threshold annealing-based routing flow is also proposed to prevent DOPPLER from falling into a sub-optimal mask density balance. Compared with existing DPL-aware detailed routing works, DOPPLER demon-stratesanaverage 73.84% of EPE hotspot reduction with a satisfactory mask density at the cost of an average increase of 0.08% wire-length, 15.14% number of stitches, and 77.28% runtime.

原文English
主出版物標題2011 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2011
頁面283-289
頁數7
DOIs
出版狀態Published - 2011
事件2011 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2011 - San Jose, CA, United States
持續時間: 7 11月 201110 11月 2011

出版系列

名字IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN(列印)1092-3152

Conference

Conference2011 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2011
國家/地區United States
城市San Jose, CA
期間7/11/1110/11/11

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