RF/High-Speed I/O ESD Protection: Co-optimizing Strategy Between BEOL Capacitance and HBM Immunity in Advanced CMOS Process

Wei Min Wu, Ming-Dou Ker*, Shih Hung Chen, Jie Ting Chen, Dimitri Linten, Guido Groeseneken

*此作品的通信作者

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7 引文 斯高帕斯（Scopus）

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Engineering & Materials Science

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