摘要
A new 2xVDD-tolerant mixed-voltage I/O buffer circuit, realized with only 1xVDD devices in deep-submicron CMOS technology, to prevent transistors against gate-oxide reliability and hot-carrier degradation is proposed. The new proposed 2xVDD-tolerant I/O buffer has been designed and fabricated in a 0.13-μm CMOS process with only 1.2-V devices to serve a 2.5-V/1.2-V mixed-voltage interface, without using the additional thick gate-oxide (2.5-V) devices. This 2xVDD-tolerant I/O buffer has been successfully confirmed by simulation and experimental results with operating speed up to 133 MHz for PCI-X compatible applications.
原文 | English |
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頁(從 - 到) | 48-56 |
頁數 | 9 |
期刊 | Microelectronics Reliability |
卷 | 50 |
發行號 | 1 |
DOIs | |
出版狀態 | Published - 1 1月 2010 |