Design and fabrication of sub-wavelength structure on silicon nitride for solar cells

Kartika Chandra Sahoo, Yi-Ming Li, Men Ku Lin, Edward Yi Chang, Jin Hua Huang

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

摘要

In this study, we explore the spectral reflectivity of pyramid-shaped silicon nitride (Si3N4) sub-wavelength structures (SWS). First, a multilayer rigorous coupled-wave approach is advanced to investigate the reflection properties of Si3N4 SWS. We first optimize Si3N4 SWS structure for the best effective reflectance properties. The results of our study show that a lowest effective reflectivity of 1.77% can be obtained for the examined Si3N4 SWS with the height of etched part of Si3N4 and the thickness of non-etched layer of 150 nm and 70 nm. Then, we develop a simple and scalable approach for fabricating SWS on silicon nitride by means of self-assembled nickel nano particle masks and inductively coupled plasma ion etching. Silicon nitride SWS surfaces with diameter of 120 nm - 180 nm and a height of 150 nm - 160 nm were obtained for lowest average reflectivity for wavelength range from 190 nm to 1000 nm. A low reflectivity below 1% was observed over wavelength from 600 to 800 nm. The measured reflectivity is closely matched with the simulated results. Using the measured reflectivity data, the solar cell characteristics has further been compared for single layer anti-reflection coatings and SWS structures and a 1.31% improvement in efficiency was observed.

原文American English
主出版物標題2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
發行者IEEE
頁面109-112
頁數4
ISBN(列印)9789810836948
出版狀態Published - 26 7月 2009
事件2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009 - Genoa, Italy
持續時間: 26 7月 200930 7月 2009

出版系列

名字2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009

Conference

Conference2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
國家/地區Italy
城市Genoa
期間26/07/0930/07/09

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