Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing

Keyphrases

• Si Surface 100%
• Ultra-low Reflection 100%
• Nanoprocessing 100%
• Black Si 100%
• Nanopatterning 33%
• Silicon Nanowires (SiNWs) 33%
• Microstructure 33%
• Light Trapping 33%
• Antireflection 33%
• High Reflectivity 33%
• Direct Laser Writing 33%
• Surface Plasmon Resonance 33%
• Metallic Nanoparticles 33%
• Broadband Antireflection 33%
• High Aspect Ratio 33%
• Ambient Air 33%
• Subwavelength Structures 33%
• Antireflection Surfaces 33%
• Nanoparticle Surface 33%
• Metal-assisted Chemical Etching 33%
• Broadband Reflection 33%
• Light Reflection 33%
• Si Nanowire Arrays 33%
• Gradient Refractive Index 33%
• Light Collection 33%
• Light Collection Efficiency 33%
• Reflection Performance 33%
• Laser Interference Lithography 33%

Engineering

• Si Surface 100%
• Laser Micro 100%
• Reflectance 100%
• Si Nanowires 66%
• Light Collection 66%
• Refractive Index 33%
• Multiphoton Lithography 33%
• High Aspect Ratio 33%
• Collection Efficiency 33%
• Optoelectronic Device 33%
• Ambient Air 33%
• Nanopatterning 33%
• Nanoparticle Surface 33%
• Laser Interference Lithography 33%
• Surface Plasmon 33%
• Refractivity 33%
• Metal Nanoparticle 33%

Material Science

• Nanowire 100%
• Reflectivity 100%
• Surface (Surface Science) 100%
• Lithography 50%
• Refractive Index 50%
• Metal Nanoparticle 50%
• Surface Plasmon Resonance 50%