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Design and Analysis of a High Linearity Full Ka-Band Stacked-FET Power Amplifier Using 0.15-μm GaAs pHEMT Process
Yun Che Hsieh, Guan Jhih Lin
*
,
Zuo Min Tsai
*
, Tzu Hung Chen
*
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電信工程研究所
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Keyphrases
Gallium Arsenide
100%
High Linearity
100%
Power Amplifier
100%
InP HEMT
100%
Ka-band
100%
Stacked-FET
100%
High Performance
16%
Performance Improvement
16%
Input Power
16%
Performance Measures
16%
Design Performance
16%
1-dB Compression Point
16%
Power Added Efficiency
16%
Wideband
16%
Power Performance
16%
High Input
16%
Nonlinear Enhancement
16%
Saturated Output Power
16%
Small-signal Gain
16%
Power Linearity
16%
Power Stage
16%
5G Wireless System
16%
Engineering
Gallium Arsenide
100%
Field Effect Transistor
100%
Power Amplifier
100%
Ka-Band
100%
Output Power
16%
Input Power
16%
Db Compression Point
16%
Power Added Efficiency
16%
Signal Gain
16%
Power Stage
16%