Design and Analysis of a High Linearity Full Ka-Band Stacked-FET Power Amplifier Using 0.15-μm GaAs pHEMT Process

Yun Che Hsieh, Guan Jhih Lin*, Zuo Min Tsai*, Tzu Hung Chen

*此作品的通信作者

研究成果: Article同行評審

指紋

深入研究「Design and Analysis of a High Linearity Full Ka-Band Stacked-FET Power Amplifier Using 0.15-μm GaAs pHEMT Process」主題。共同形成了獨特的指紋。

Keyphrases

Engineering