Design and Analysis of a High Linearity Full Ka-Band Stacked-FET Power Amplifier Using 0.15-μm GaAs pHEMT Process

Yun Che Hsieh, Guan Jhih Lin*, Zuo Min Tsai*, Tzu Hung Chen

*此作品的通信作者

研究成果: Article同行評審

4 引文 斯高帕斯(Scopus)

摘要

This letter presents the design and measured performance of a full Ka-band stacked-FET power amplifier (PA) fabricated using the 0.15-m Gallium arsenide (GaAs) pHEMT process. A stacked FET configuration is adopted in the power stage of the PA to achieve wideband power performance and linearity improvement at high input power. Measurements indicate that the proposed PA has a small-signal gain of 17 dB, a saturated output power (PSAT ) of 24.5 dBm, an output 1-dB compression point (OP1dB) of 24.3 dBm, and a power-added efficiency (PAE) of 33.3%. The bandwidth of the PA ranges from 26 to 40 GHz, and thus covers the entire Ka-band. The proposed PA exhibits high performance, which makes it suitable for the applications of 5G wireless systems.

原文English
頁(從 - 到)427-430
頁數4
期刊IEEE Microwave and Wireless Technology Letters
34
發行號4
DOIs
出版狀態Published - 1 4月 2024

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