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Deposition and characterization of Ti(C,N,O) coatings by unbalanced megnetron sputtering
J. H. Hsieh
*
, W. Wu,
C. Li
, C. H. Yu, B. H. Tan
*
此作品的通信作者
生物醫學工程學系
研究成果
:
Article
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同行評審
41
引文 斯高帕斯(Scopus)
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重量
按字母排序
Engineering & Materials Science
Sputtering
100%
Characterization (materials science)
68%
Coatings
58%
Oxygen
45%
Flow rate
33%
Glow discharges
16%
Magnetron sputtering
14%
Nanoindentation
13%
Spectrometers
13%
Alumina
11%
X ray diffraction
10%
Thin films
10%
Wear resistance
10%
Nitrogen
10%
Adhesion
10%
Hardness
8%
Wear of materials
8%
Color
8%
Friction
7%
Testing
5%
Physics & Astronomy
sputtering
61%
coatings
52%
characterization
43%
flow velocity
35%
oxygen
33%
balls
20%
wear resistance
12%
nanoindentation
11%
glow discharges
11%
coefficient of friction
11%
adhesion
9%
magnetron sputtering
9%
aluminum oxides
9%
hardness
8%
spectrometers
8%
nitrogen
8%
color
7%
diffraction
5%
thin films
5%
x rays
5%
performance
4%
Chemical Compounds
Sputtering
84%
Coating Agent
46%
Flow Kinetics
34%
Dioxygen
27%
Wear Rate
14%
Glow Discharge
13%
Magnetron Sputtering
12%
Friction Coefficient
12%
Wear
10%
Flow
7%
Resistance
7%
Nitrogen
6%
X-Ray Diffraction
5%