TY - JOUR
T1 - Degradation Kinetics and Pathways of Isopropyl Alcohol by Microwave-Assisted Oxidation Process
AU - Tran, Quynh Thi Phuong
AU - Chuang, Yi-Hsueh
AU - Tan, Steve
AU - Hsieh, Chi Hsu
AU - Yang, Tung Yu
AU - Tung, Hsin Hsin
N1 - Funding Information:
This work was supported by the National Taiwan University from Excellence Research Program—Core Consortiums (NTUCCP-109L891204) within the framework of the Higher Education Sprout Project by the Ministry of Education (MOE) in Taiwan. The authors extend their thanks to Prof. Shang-Lien Lo and Prof. Angela Yu-Chen Lin ‘s research group at the National Taiwan University for their technical support on byproduct analysis.
Publisher Copyright:
©
PY - 2021/9/1
Y1 - 2021/9/1
N2 - Isopropyl alcohol (IPA) is a significant pollutant in the wastewater of semiconductor manufacturing industry. This study investigated the degradation of IPA in the microwave (MW)-assisted oxidation process using hydrogen peroxide (H2O2) as the oxidant. Complete elimination of IPA was noted in the MW/H2O2 system within 90 min of irradiation. In comparison, only 4.8, 6.1, and 68.2% of IPA, respectively, was removed in MW irradiation alone, H2O2 oxidation, and the system using the combination of thermal (TH) and H2O2. The degradation kinetics of IPA followed the pseudo-first-order in MW/H2O2 and TH/H2O2 systems, whereas the pseudo-zero-order reaction kinetics was observed in others. The degradation rates increased on increasing the hydrogen peroxide dose to a certain level. An excess H2O2 would trap the hydroxyl radicals (•OH) to form weaker radicals that inhibit IPA oxidation. A series of degradation intermediates were identified and quantified corresponding to acetone and short-chain organic acids. Finally, the degradation pathways of IPA were proposed and validated by the total organic carbon mass balance.
AB - Isopropyl alcohol (IPA) is a significant pollutant in the wastewater of semiconductor manufacturing industry. This study investigated the degradation of IPA in the microwave (MW)-assisted oxidation process using hydrogen peroxide (H2O2) as the oxidant. Complete elimination of IPA was noted in the MW/H2O2 system within 90 min of irradiation. In comparison, only 4.8, 6.1, and 68.2% of IPA, respectively, was removed in MW irradiation alone, H2O2 oxidation, and the system using the combination of thermal (TH) and H2O2. The degradation kinetics of IPA followed the pseudo-first-order in MW/H2O2 and TH/H2O2 systems, whereas the pseudo-zero-order reaction kinetics was observed in others. The degradation rates increased on increasing the hydrogen peroxide dose to a certain level. An excess H2O2 would trap the hydroxyl radicals (•OH) to form weaker radicals that inhibit IPA oxidation. A series of degradation intermediates were identified and quantified corresponding to acetone and short-chain organic acids. Finally, the degradation pathways of IPA were proposed and validated by the total organic carbon mass balance.
UR - https://www.scopus.com/pages/publications/85114424149
U2 - 10.1021/acs.iecr.1c01464
DO - 10.1021/acs.iecr.1c01464
M3 - Article
AN - SCOPUS:85114424149
SN - 0888-5885
VL - 60
SP - 12461
EP - 12473
JO - Industrial and Engineering Chemistry Research
JF - Industrial and Engineering Chemistry Research
IS - 34
ER -