Deep ultraviolet algan-based light-emitting diodes with p-algan/algan superlattice hole injection structures

Tien Yu Wang, Wei Chih Lai*, Syuan Yu Sie, Sheng Po Chang, Cheng Huang Kuo, Jinn Kong Sheu

*此作品的通信作者

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

The p-AlGaN/AlGaN superlattice (SL) hole injection structure was introduced into deep ultraviolet (DUV) light-emitting diodes (LEDs) to enhance their performances. The period thick-nesses of the p-Al0.8Ga0.2N/Al0.48Ga0.52N SLs affected the performances of the DUV LEDs. The appropriate period thickness of the p-Al0.8Ga0.2N/Al0.48Ga0.52N SL may enhance the hole injection of DUV LEDs. Therefore, compared with the reference LEDs, the DUV LEDs with the 10-pair Al0.8Ga0.2N (1 nm)/Al0.48Ga0.52N (1 nm) SL presented forward voltage reduction of 0.23 V and light output power improvement of 15% at a current of 350 mA. Furthermore, the 10-pair Al0.8Ga0.2N (1 nm)/Al0.48Ga0.52N (1 nm) SL could slightly suppress the Auger recombination and current over-flow of the DUV LEDs in a high-current operation region. In addition to improved carrier injection, the DUV LEDs with the p-Al0.8Ga0.2N/Al0.48Ga0.52N SL hole injection structure showed reduced light absorption at their emission wavelength compared with the reference LEDs. Therefore, the DUV LEDs with p-Al0.8Ga0.2N/Al0.48Ga0.52N SL may exhibit better light extraction efficiency than the reference LEDs. The enhancement of p-Al0.8Ga0.2N (1 nm)/Al0.48Ga0.52N (1 nm) SL may contribute to improvements in light extraction and hole injection.

原文English
文章編號1727
期刊Processes
9
發行號10
DOIs
出版狀態Published - 10月 2021

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