DC/AC/RF Characteristics of Multi-Channel GAA NS FETs with ML and BL MoS2

Yueh Ju Chan*, Sekhar Reddy Kola, Yiming Li

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

For the first time, we examine the performance of gate-all-around nanosheet field effect transistor (GAA NS FET) with both monolayer (ML) and bilayer (BL) molybdenum disulfide (MoS2). As compared to the control sample of silicon (Si), MoS2 devices exhibit reduced short-channel effects (SCE) owing to its larger band gap and larger effective mass. The GAA NS FET with BL MoS2 possesses moderate energy bandgap and large channel thickness which exhibits superior on state current and voltage gain.

原文English
主出版物標題2023 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2023
發行者Institute of Electrical and Electronics Engineers Inc.
頁面61-64
頁數4
ISBN(電子)9784863488038
DOIs
出版狀態Published - 2023
事件2023 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2023 - Kobe, Japan
持續時間: 27 9月 202329 9月 2023

出版系列

名字International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Conference

Conference2023 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2023
國家/地區Japan
城市Kobe
期間27/09/2329/09/23

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