Curvature of substrates is measured by means of a self-mixing scheme

Keyphrases

• Metal-organic Chemical Vapor Deposition (MOCVD) 100%
• Wafer Surface 100%
• Radius of Curvature 100%
• Self-mixing 100%
• Mixing Schemes 100%
• In Situ Measurements 50%
• Epitaxial Layers 50%
• Diode Laser 50%
• Non-contact 50%
• Inclination Angle 50%
• Angular Resolution 50%
• Deposition Chamber 50%
• Source Separation 50%
• Triangulation 50%
• Position Sensitive Detector 50%
• Observation Window 50%
• Camber 50%
• Deposition Window 50%
• Interferometric Detectors 50%
• Back Reflection 50%
• Wafer Rotation 50%
• Beam Deflection Method 50%
• Laser Beam Deflection 50%

Engineering

• Metal Organic Chemical Vapor Deposition 100%
• Data Show 50%
• Inclination Angle 50%
• Angular Resolution 50%
• Sensitive Detector 50%
• Observation Window 50%
• Situ Measurement 50%
• Deflection Method 50%
• Beam Deflection 50%
• Epitaxial Film 50%
• Laser Beams 50%