摘要
The light extraction efficiency of the QDCC-based microLED displays is strong related to the aspect ratio (width/thickness) of the patterned QDCC pixels, because the very thin QDCC films and BM banks are required for the realization of high-resolution microdisplays for AR and VR applications. We formulate high resolution QD photoresist, which can achieve color gamut higher than 85% BT. 2020 coverage at film feature resolution of 5 fim and the total thickness of QDCC and traditional CF less than 2.5 fim. The atomic layer deposition is also processed to protect the device, which results in prominent enhancement on the reliability performance.
原文 | English |
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頁(從 - 到) | 206-209 |
頁數 | 4 |
期刊 | Digest of Technical Papers - SID International Symposium |
卷 | 53 |
發行號 | 1 |
DOIs | |
出版狀態 | Published - 2022 |
事件 | 59th International Symposium, Seminar and Exhibition, Display Week 2022 - San Jose, United States 持續時間: 8 5月 2022 → 13 5月 2022 |