CO₂ laser annealing synthesis of silicon nanocrystals buried in Si-rich SiO₂

Keyphrases

• Silica 100%
• SiO2 Film 100%
• Silicon Nanocrystals 100%
• CO2 Laser Annealing 100%
• Annealing 75%
• Laser Intensity 50%
• Si Nanocrystals 50%
• Nc-Si 50%
• In Situ 25%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 25%
• Cm(III) 25%
• Spot Size 25%
• Refractive Index 25%
• Structural Defects 25%
• CO2 Laser 25%
• Blue Photoluminescence 25%
• Ablation Threshold 25%
• Transmission Electron Microscopy Analysis 25%
• Near-infrared Photoluminescence 25%
• Surface Temperature 25%
• Size-density 25%
• Volume Density 25%
• Localized Synthesis 25%
• Irreversible Damage 25%
• Ablation Damage 25%

Material Science

• Carbon Dioxide 100%
• Film 100%
• Silicon 100%
• Annealing 75%
• Photoluminescence 50%
• Density 25%
• Transmission Electron Microscopy 25%
• Electron Microscopy 25%
• Refractive Index 25%
• Surface (Surface Science) 25%