Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu, Fang Hao Yeh, Yu Cheng Chin, Chun In Cheung, Zi Chun Chia, Li Xing Yang, Ya Jyun Chen, Ting Yu Cheng, Shu Pao Wu, Pei Jane Tsai*, Nan Yao Lee, Mei Yi Liao, Chih Chia Huang

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