Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu; Fang Hao Yeh; Yu Cheng Chin; Chun In Cheung; Zi Chun Chia; Li Xing Yang; Ya Jyun Chen; Ting Yu Cheng; Shu Pao Wu; Pei Jane Tsai; Nan Yao Lee; Mei Yi Liao; Chih Chia Huang

doi:10.1016/j.cej.2021.131957

Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu, Fang Hao Yeh, Yu Cheng Chin, Chun In Cheung, Zi Chun Chia, Li Xing Yang, Ya Jyun Chen, Ting Yu Cheng, Shu Pao Wu, Pei Jane Tsai^*, Nan Yao Lee, Mei Yi Liao, Chih Chia Huang

^*此作品的通信作者

國立陽明交通大學

研究成果: Comment/debate

摘要

In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.

原文	English
文章編號	131957
期刊	Chemical Engineering Journal
卷	428
DOIs	https://doi.org/10.1016/j.cej.2021.131957
出版狀態	Published - 15 1月 2022

存取文件

10.1016/j.cej.2021.131957

其它文件與鏈接

Link to publication in Scopus

指紋

深入研究「Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))」主題。共同形成了獨特的指紋。

引用此

Hsu, I. L., Yeh, F. H., Chin, Y. C., Cheung, C. I., Chia, Z. C., Yang, L. X., Chen, Y. J., Cheng, T. Y., Wu, S. P., Tsai, P. J., Lee, N. Y., Liao, M. Y., & Huang, C. C. (2022). Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). Chemical Engineering Journal, 428, [131957]. https://doi.org/10.1016/j.cej.2021.131957

Hsu, I. Ling ; Yeh, Fang Hao ; Chin, Yu Cheng 等. / Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles : New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). 於: Chemical Engineering Journal. 2022 ; 卷 428.

@article{7a7de5aa975f4a41a30c499a9413c559,

title = "Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))",

abstract = "In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.",

author = "Hsu, {I. Ling} and Yeh, {Fang Hao} and Chin, {Yu Cheng} and Cheung, {Chun In} and Chia, {Zi Chun} and Yang, {Li Xing} and Chen, {Ya Jyun} and Cheng, {Ting Yu} and Wu, {Shu Pao} and Tsai, {Pei Jane} and Lee, {Nan Yao} and Liao, {Mei Yi} and Huang, {Chih Chia}",

note = "Publisher Copyright: {\textcopyright} 2021 Elsevier B.V.",

year = "2022",

month = jan,

day = "15",

doi = "10.1016/j.cej.2021.131957",

language = "English",

volume = "428",

journal = "Chemical Engineering Journal",

issn = "1385-8947",

publisher = "Elsevier",

}

Hsu, IL, Yeh, FH, Chin, YC, Cheung, CI, Chia, ZC, Yang, LX, Chen, YJ, Cheng, TY, Wu, SP, Tsai, PJ, Lee, NY, Liao, MY & Huang, CC 2022, 'Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))', Chemical Engineering Journal, 卷 428, 131957. https://doi.org/10.1016/j.cej.2021.131957

Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles : New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). / Hsu, I. Ling; Yeh, Fang Hao; Chin, Yu Cheng 等.

於: Chemical Engineering Journal, 卷 428, 131957, 15.01.2022.

研究成果: Comment/debate

TY - JOUR

T1 - Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles

T2 - New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

AU - Hsu, I. Ling

AU - Yeh, Fang Hao

AU - Chin, Yu Cheng

AU - Cheung, Chun In

AU - Chia, Zi Chun

AU - Yang, Li Xing

AU - Chen, Ya Jyun

AU - Cheng, Ting Yu

AU - Wu, Shu Pao

AU - Tsai, Pei Jane

AU - Lee, Nan Yao

AU - Liao, Mei Yi

AU - Huang, Chih Chia

PY - 2022/1/15

Y1 - 2022/1/15

N2 - In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.

AB - In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.

UR - http://www.scopus.com/inward/record.url?scp=85114183518&partnerID=8YFLogxK

U2 - 10.1016/j.cej.2021.131957

DO - 10.1016/j.cej.2021.131957

M3 - Comment/debate

AN - SCOPUS:85114183518

SN - 1385-8947

VL - 428

JO - Chemical Engineering Journal

JF - Chemical Engineering Journal

M1 - 131957

ER -

Hsu IL, Yeh FH, Chin YC, Cheung CI, Chia ZC, Yang LX 等. Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). Chemical Engineering Journal. 2022 1月 15;428:131957. doi: 10.1016/j.cej.2021.131957