Controlled deposition of new organic ultrathin film as a gate dielectric layer for advanced flexible capacitor devices

Keyphrases

• Capacitance 100%
• Leakage Current Density 100%
• Gate Dielectric Layer 100%
• Controlled Deposition 100%
• Organic Ultrathin Film 100%
• 1-bromoadamantane 100%
• Flexible Capacitors 100%
• Ultrathin Films 66%
• Ultrathin 33%
• Dielectric 33%
• Gate Dielectric 33%
• Flexible Substrate 33%
• Current Density-voltage 33%
• Room Temperature 33%
• Metal-insulator-metal Capacitor 33%
• Low Loss 33%
• Low Leakage Current 33%
• Dielectric Constant 33%
• Sol-gel Spin Coating 33%
• Breakdown Voltage 33%
• Gate Voltage 33%
• Polar Groups 33%
• Adhesion 33%
• Spin Coating Technique 33%
• Chemical Structure 33%
• Bromine Atom 33%
• Film-forming 33%
• Flexible Polyimide Substrates 33%
• Fourier Transform Infrared Spectrometer 33%
• Metal-insulator-metal Devices 33%
• Polar Lows 33%

Material Science

• Capacitor 100%
• Dielectric Material 100%
• Ultrathin Film 100%
• Density 75%
• Capacitance 75%
• Film 50%
• Thin Films 25%
• Sol-Gel 25%
• Spin Coating 25%
• Permittivity 25%
• Polyimide 25%
• Coating Process 25%
• Structure (Composition) 25%