Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films
- Ratnabali Banerjee*
- , S. N. Sharma
- , S. Chattopadhyay
- , A. K. Batabyal
- , A. K. Barua
*此作品的通信作者
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斯高帕斯（Scopus）