Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films
Ratnabali Banerjee*, S. N. Sharma, S. Chattopadhyay, A. K. Batabyal, A. K. Barua
深入研究「Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films」主題。共同形成了獨特的指紋。