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Contact reactions between amorphous silicon and single-crystal metallic films
U. Köster
*
, D. R. Campbell, King-Ning Tu
*
此作品的通信作者
國際半導體產業學院
研究成果
:
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同行評審
15
引文 斯高帕斯(Scopus)
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Engineering & Materials Science
Metallic films
100%
Amorphous silicon
81%
Single crystals
68%
Silicides
54%
Palladium
52%
Gold
43%
Chromium
42%
Metals
38%
Silicon
31%
Electron diffraction
26%
Surface chemistry
26%
Electron microscopy
25%
Electron beams
23%
Nucleation
20%
Evaporation
19%
Crystals
19%
Salts
18%
Rocks
16%
Pumps
15%
Substrates
14%
Temperature
7%
Physics & Astronomy
amorphous silicon
54%
single crystals
37%
palladium
32%
silicides
30%
chromium
27%
gold
23%
halites
19%
silicon
16%
silicon films
15%
metal films
15%
metals
15%
electron microscopy
12%
electron diffraction
12%
evaporation
11%
nucleation
11%
electron beams
10%
pumps
10%
room temperature
8%
crystals
7%
Chemical Compounds
Amorphous Silicon
80%
Single Crystalline Solid
42%
Liquid Film
28%
Electron Beam Evaporation
22%
Palladium
22%
Metal
20%
Electron Diffraction
15%
Surface Chemistry
13%
Nucleation
12%
Transmission Electron Microscopy
9%
Ambient Reaction Temperature
8%