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Comparison of performance in GaN-HEMTs on thin SiC substrate and sapphire substrates
Tsung Po Chuang,
Niall Tumilty
, Chia Hao Yu,
Ray Hua Horng
*
*
此作品的通信作者
國際半導體產業學院
電子研究所
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引文 斯高帕斯(Scopus)
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Keyphrases
Sapphire Substrate
100%
GaN HEMT
100%
Performance Comparison
100%
SiC Substrate
100%
MCM2
66%
Surface Roughness
33%
Electrical Properties
33%
Grain Boundary
33%
Sapphire
33%
GaN-based
33%
Device Performance
33%
DC Current
33%
High Electron Mobility Transistor
33%
SEM Analysis
33%
XRD Analysis
33%
In Situ TEM
33%
Drain Spacing
33%
Three-terminal
33%
Valuable Insight
33%
Off-state Breakdown Voltage
33%
N-Type 4H-SiC
33%
4H-SiC Substrates
33%
AFM Analysis
33%
Morphological Abnormalities
33%
Structural Disparities
33%
Baliga's Figure of Merit
33%
N-SiC
33%
Material Science
Sapphire
100%
X-Ray Diffraction
50%
Transistor
25%
Surface Roughness
25%
Electron Mobility
25%
Scanning Electron Microscopy
25%
Morphology
25%
Grain Boundary
25%
Engineering
Sapphire Substrate
100%
Figure of Merit
33%
Breakdown Voltage
33%
Device Performance
33%
Drain Spacing
33%
Direct Current
33%