Comparison of high voltage, vertical geometry Ga2O3 rectifiers with GaN and SiC

J. C. Yang, Chaker Fares, P. H. Carey, Minghan Man, Fan Ren, Marko Tadjer, Y. T. Chen, Yu Te Liao, Chin Wei Chang, Jenshan Lin, Ribhu Sharma, Mark E. Law, Peter E. Raad, Pavel L. Komarov, David J. Smith, Akito Kuramata, S. J. Pearton

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

摘要

Ga2O3 is a candidate for power electronics due to its large bandgap, controllable doping and availability of large diameter, inexpensive substrates. These include power conditioning systems, pulsed power for avionics and electric ships, solid-state drivers for heavy electric motors and advanced power management and control electronics. There are cases where the performance exceeds the theoretical values for SiC. Existing Si, SiC (vertical devices), and heteroepitaxial GaN (lateral devices) enjoy advantages in terms of process maturity, especially for Si, where devices such as superjunctions which surpass the unipolar "limit". Continued development of low defect substrates, optimized epi growth and device design and processing methods for Ga2O3 are required to push the experimental results closer to their theoretical values. The actual experimental value of Vb is well below the theoretical predictions. Thermal management is a key issue in Ga2O3 devices and initial studies have appeared on both the experimental and theoretical fronts.

原文English
主出版物標題Gallium Nitride and Silicon Carbide Power Technologies 9
編輯M. Dudley, B. Raghothamachar, N. Ohtani, M. Bakowski, K. Shenai
發行者Electrochemical Society Inc.
頁面15-24
頁數10
版本7
ISBN(電子)9781607685395
DOIs
出版狀態Published - 1 1月 2019
事件Symposium on Gallium Nitride and Silicon Carbide Power Technologies 9 - 236th ECS Meeting - Atlanta, 美國
持續時間: 13 10月 201917 10月 2019

出版系列

名字ECS Transactions
號碼7
92
ISSN(列印)1938-6737
ISSN(電子)1938-5862

Conference

ConferenceSymposium on Gallium Nitride and Silicon Carbide Power Technologies 9 - 236th ECS Meeting
國家/地區美國
城市Atlanta
期間13/10/1917/10/19

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