Compact Modeling and Experimental Validation of Reverse Mode Impact Ionization in LDMOS Transistors within the BSIM-BULK Framework

Yawar Hayat Zarkob*, Ayushi Sharma, Girish Pahwa, Debashish Nandi, Chetan K. Dabhi, Volker Kubrak, Bob Peddenpohl, Mingchun Tang, Chenming Hu, Yogesh Singh Chauhan

*此作品的通信作者

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

摘要

This study introduces a compact model for reverse mode impact ionization current in Laterally-Diffused-Metal-Oxide-Semiconductor (LDMOS) transistors. Due to the asymmetrical nature of LDMOS transistors, magnitude of substrate current under forward (V_ds > 0V) and reverse (V_ds < 0V) modes can differ by orders of magnitude. We discuss the reverse impact ionization current model in this work which is then integrated into the BSIM-BULK high voltage compact model framework. The efficacy of the model is supported by calibrated TCAD simulations and model to hardware correlation is also presented.

原文English
主出版物標題IEEE Electron Devices Technology and Manufacturing Conference
主出版物子標題Strengthening the Globalization in Semiconductors, EDTM 2024
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9798350371529
DOIs
出版狀態Published - 2024
事件8th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2024 - Bangalore, 印度
持續時間: 3 3月 20246 3月 2024

出版系列

名字IEEE Electron Devices Technology and Manufacturing Conference: Strengthening the Globalization in Semiconductors, EDTM 2024

Conference

Conference8th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2024
國家/地區印度
城市Bangalore
期間3/03/246/03/24

指紋

深入研究「Compact Modeling and Experimental Validation of Reverse Mode Impact Ionization in LDMOS Transistors within the BSIM-BULK Framework」主題。共同形成了獨特的指紋。

引用此