CMOS and interconnect reliability - Reliability of thin oxides

H. Iwai^*, J. Suñé

^*此作品的通信作者

研究成果: Short survey › 同行評審

原文	English
頁（從 - 到）	321
頁數	1
期刊	Technical Digest - International Electron Devices Meeting
出版狀態	Published - 12月 2000
事件	2000 IEEE International Electron Devices Meeting - San Francisco, CA, 美國持續時間: 10 12月 2000 → 13 12月 2000

其它文件與鏈接

@article{00f5d52786504b7c8f5f80a308f40a8c,

title = "CMOS and interconnect reliability - Reliability of thin oxides",

author = "H. Iwai and J. Su{\~n}{\'e}",

year = "2000",

month = dec,

language = "English",

pages = "321",

journal = "Technical Digest - International Electron Devices Meeting",

issn = "0163-1918",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "2000 IEEE International Electron Devices Meeting ; Conference date: 10-12-2000 Through 13-12-2000",

}

TY - JOUR

T1 - CMOS and interconnect reliability - Reliability of thin oxides

AU - Iwai, H.

AU - Suñé, J.

PY - 2000/12

Y1 - 2000/12

UR - http://www.scopus.com/inward/record.url?scp=17944394905&partnerID=8YFLogxK

M3 - Short survey

AN - SCOPUS:17944394905

SN - 0163-1918

SP - 321

JO - Technical Digest - International Electron Devices Meeting

JF - Technical Digest - International Electron Devices Meeting

T2 - 2000 IEEE International Electron Devices Meeting

Y2 - 10 December 2000 through 13 December 2000

ER -