Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography

Chun Cheng Yeh*, Hung Chuan Liu, Wajdi Heni, Dominique Berling, Hsiao-Wen Zan, Olivier Soppera

*此作品的通信作者

研究成果: Article同行評審

29 引文 斯高帕斯(Scopus)

指紋

深入研究「Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography」主題。共同形成了獨特的指紋。

Keyphrases

Material Science