Characterization of plasma charging damage in ultrathin gate oxides

Horng-Chih Lin*, M. F. Wang, C. C. Chen, S. K. Hsien, Chao-Hsin Chien, T. Y. Huang, C. Y. Chang, Tien-Sheng Chao

*此作品的通信作者

研究成果: Conference article同行評審

13 引文 斯高帕斯(Scopus)

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Engineering & Materials Science