Characterization of high-k gate dielectric and metal gate electrode semiconductor samples with a total reflection X-ray fluorescence spectrometer

Chris M. Sparks*, Meredith R. Beebe, Joe Bennett, Brendan Foran, Carolyn Gondran, Tuo-Hung Hou

*此作品的通信作者

研究成果: Conference article › 同行評審

12 引文 斯高帕斯（Scopus）

指紋

深入研究「Characterization of high-k gate dielectric and metal gate electrode semiconductor samples with a total reflection X-ray fluorescence spectrometer」主題。共同形成了獨特的指紋。

Keyphrases

Material Science

Engineering

Chemical Engineering