Characteristics of poly-si nanowire transistors with multiple-gate configurations

Hsing H. Hsu*, Horng-Chih Lin, Ko H. Lee, Jian F. Huang, Tiao Yuan Huang

*此作品的通信作者

研究成果: Conference contribution同行評審

4 引文 斯高帕斯(Scopus)
原文English
主出版物標題2008 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA
頁面101-102
頁數2
DOIs
出版狀態Published - 14 八月 2008
事件2008 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Hsinchu, Taiwan
持續時間: 21 四月 200823 四月 2008

出版系列

名字International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Conference

Conference2008 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA
國家/地區Taiwan
城市Hsinchu
期間21/04/0823/04/08

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