摘要
We have fabricated Pb(Zr0.53Ti0.47)O3 on Pt and Pb(Zr0.53Ti0.47)O3 on 4 nm Al2O3/Si substrates. Although Pb(Zr0.53Ti0.47)O3 on Pt has a larger dielectric constant and grain size than those on Al2O3/Si, the Pb(Zr0.53Ti0.47)O3 thin films on both substrates show good capacitance-voltage characteristics and the same threshold voltage shift of ∼3.6 V. Moreover, the leakage current density of Pb(Zr0.53Ti0.47)O3 on Al2O3/Si at -10 V is nearly three orders of magnitude lower than that of Pb(Zr0.53Ti0.47)O3 on Pt. The comparable memory characteristics and the lower leakage current of Pb(Zr0.53Ti0.47)O3 on Al2O3/Si are important for continuous scaling down the ferroelectric memory.
原文 | English |
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頁(從 - 到) | F203-F206 |
頁數 | 4 |
期刊 | Journal of the Electrochemical Society |
卷 | 148 |
發行號 | 11 |
DOIs | |
出版狀態 | Published - 11月 2001 |