Characteristics of Pb(Zr0.53Ti0-47)O3 on Metal and Al2O3/Si Substrates

C. L. Sun*, San-Yuan Chen, M. Y. Yang, Albert Chin

*此作品的通信作者

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

摘要

We have fabricated Pb(Zr0.53Ti0.47)O3 on Pt and Pb(Zr0.53Ti0.47)O3 on 4 nm Al2O3/Si substrates. Although Pb(Zr0.53Ti0.47)O3 on Pt has a larger dielectric constant and grain size than those on Al2O3/Si, the Pb(Zr0.53Ti0.47)O3 thin films on both substrates show good capacitance-voltage characteristics and the same threshold voltage shift of ∼3.6 V. Moreover, the leakage current density of Pb(Zr0.53Ti0.47)O3 on Al2O3/Si at -10 V is nearly three orders of magnitude lower than that of Pb(Zr0.53Ti0.47)O3 on Pt. The comparable memory characteristics and the lower leakage current of Pb(Zr0.53Ti0.47)O3 on Al2O3/Si are important for continuous scaling down the ferroelectric memory.

原文English
頁(從 - 到)F203-F206
頁數4
期刊Journal of the Electrochemical Society
148
發行號11
DOIs
出版狀態Published - 11月 2001

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