Characteristics of nonalloyed pseudomorphic high electron mobility transistors using InAs/InxGa1-xAs (x = 1 → 0)/ AlyGa1-yAs (y = 0 → 0.3) contact structures

Sheu Shung Chen*, Chien-Cheng Lin, Wen Ho Lan, Sun Li Tu, Chin Kun Peng


研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)


A molecular beam epitaxy InAs/InxGa1-xAs (x = 1 → 0)/AlyGa1-yAs (y = 0 → 0.3) heterojunction was used as an ohmic contact structure to the GaAs-based pseudomorphic high electron mobility transistors (PHEMTs). This nonalloyed PHEMT had a specific contact resistance rc of 1.05 × 10-7 Ω·cm2 and an extrinsic transconductance gme of 272 mS/mm for devices with 1 μm gate-length. Microwave measurements showed a current gain cut-off frequency ft of 22 GHz and a maximum oscillation frequency fmax of 43 GHz. These results are comparable to our best conventional PHEMTs' alloyed at 450°C and 2 min duration. Meanwhile, a small-signal equivalent circuit model of the nonalloyed PHEMT has also been demonstrated.

頁(從 - 到)3443-3447
期刊Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
發行號6 A
出版狀態Published - 1 六月 1997


深入研究「Characteristics of nonalloyed pseudomorphic high electron mobility transistors using InAs/In<sub>x</sub>Ga<sub>1-x</sub>As (x = 1 → 0)/ Al<sub>y</sub>Ga<sub>1-y</sub>As (y = 0 → 0.3) contact structures」主題。共同形成了獨特的指紋。