Characteristics of low-k methyl-silsesquiazane (MSZ) for CMP process using oxygen plasma pretreatment

Po-Tsun Liu*, TC Chang, TM Tsai, ST Yan, YC Chang, H Aoki, TY Tseng

*此作品的通信作者

研究成果: Conference contribution同行評審

指紋

深入研究「Characteristics of low-k methyl-silsesquiazane (MSZ) for CMP process using oxygen plasma pretreatment」主題。共同形成了獨特的指紋。

Physics & Astronomy