摘要
The sputtering rate during a plasma-assisted process was calculated. Monte Carlo simulation was used for the calculation. It was observed that sputtering was one of the most important mechanisms occurring on the cathod during a plasma-assisted process.
| 原文 | English |
|---|---|
| 頁（從 - 到） | 1125-1126 |
| 頁數 | 2 |
| 期刊 | Journal of Materials Science Letters |
| 卷 | 22 |
| 發行號 | 16 |
| DOIs | |
| 出版狀態 | Published - 15 8月 2003 |