Breakdown characteristics of ultra-thin gate oxides caused by plasma charging

Chi Chun Chen, Horng-Chih Lin, Chun Yen Chang

研究成果: Conference article同行評審

摘要

Breakdown characteristics of ultra-thin gate oxides caused by plasma charging were studied in this work. It is observed that as oxide thickness is scaled down to 4 nm, some traditional monitor parameters may lose their sensitivity for detecting oxide degradation induced by plasma charging damage, due to insignificant trap generation. Even the gate leakage current, although sensitive for 4 nm oxide, may no longer be sensitive enough for even thinner oxide (e.g., 2.6 nm), due to the existence of large tunneling current. Moreover, several soft-breakdown events were found to occur in ultrathin oxide before the final onset of a catastrophic hard-breakdown. Finally, an equivalent local oxide thickness is calculated using local oxide thinning model to estimate the stepwise increase of gate current after soft-breakdown event.

原文English
頁(從 - 到)313-319
頁數7
期刊Materials Research Society Symposium - Proceedings
567
DOIs
出版狀態Published - 1 12月 1999
事件Proceedings of the 1999 MRS Spring Meeting - Symposium on Ultrathin SiO2 and High-k Materials for ULSI Gate Dielectrics - San Francisco, CA, USA
持續時間: 5 4月 19998 4月 1999

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