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Boron-doping effect on the super-high density Si quantum dot thin films utilizing a gradient Si-rich oxide multilayer structure
Pin Ruei Huang, You Cheng Chen, Kuang Yang Kuo,
Po-Tsung Lee
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光電工程學系
研究成果
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引文 斯高帕斯(Scopus)
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Keyphrases
Multilayer Structure
100%
Quantum Dot Film
100%
Boron Doping
100%
Doping Effect
100%
Silicon Quantum Dots (Si QDs)
100%
Super-high Density
100%
Si-rich Oxide
100%
Photovoltaic Properties
40%
Doping Concentration
40%
Multilayer Thin Films
40%
B-doped
40%
B-doping
40%
High Efficiency
20%
Crystalline Properties
20%
Electrical Properties
20%
Thin Film Structure
20%
High Crystallinity
20%
Optoelectronic Properties
20%
Boron
20%
Optical Band Gap
20%
Tunneling Probability
20%
Co-sputtering
20%
Carrier Tunneling
20%
Si-based Solar Cell
20%
Material Science
Density
100%
Thin Films
100%
Quantum Dot
100%
Oxide Compound
100%
Boron
100%
Laminate
100%
Photovoltaics
40%
Solar Cell
20%
Thin Film Structure
20%
Engineering
Quantum Dot
100%
Thin Films
100%
Super High
100%
Laminate
100%
Photovoltaic Effect
40%
Crystallinity
20%
Tunnel Construction
20%
Based Solar Cell
20%
Boron (B)
20%
Band Gap
20%
Chemical Engineering
Film
100%