跳至主導覽
跳至搜尋
跳過主要內容
國立陽明交通大學研發優勢分析平台 首頁
English
中文
首頁
人員
單位
研究成果
計畫
獎項
活動
貴重儀器
影響
按專業知識、姓名或所屬機構搜尋
Beyond Substrates: Strain Engineering of Ferroelectric Membranes
David Pesquera
*
, Eric Parsonnet
, Alexander Qualls
, Ruijuan Xu
, Andrew J. Gubser
, Jieun Kim
, Yizhe Jiang
, Gabriel Velarde
,
Yen-Lin Huang
, Harold Y. Hwang
, Ramamoorthy Ramesh
, Lane W. Martin
*
此作品的通信作者
材料科學與工程學系
研究成果
:
Article
›
同行評審
111
引文 斯高帕斯(Scopus)
總覽
指紋
指紋
深入研究「Beyond Substrates: Strain Engineering of Ferroelectric Membranes」主題。共同形成了獨特的指紋。
排序方式
重量
按字母排序
Keyphrases
Capacitors
33%
CMOS Technology
33%
Coercive Field
33%
Crystal Quality
33%
Deterministic Control
33%
Dielectric Permittivity
33%
Engineered Substrate
33%
Epitaxial Growth
33%
Epitaxial Lift-off
33%
Ferroelectric BaTiO3
33%
Ferroelectric Domain Dynamics
33%
Ferroelectric Membrane
100%
Ferroelectric Memory
33%
Ferroelectric Oxides
33%
Ferroelectric Switching Dynamics
33%
Flexible Nanosensor
33%
Flexible Polymer
33%
High-crystalline
33%
Interlayer Stress
66%
Material Phase
33%
Material Properties
33%
Material Structure
33%
Mechanical Tunability
33%
Metal Structure
33%
Ordering Temperature
33%
Oxide Metal
66%
Perovskite Oxide
33%
Room Temperature
33%
Strain Engineering
100%
Strain State
33%
Structural Tuning
33%
Structure Phase
33%
Structure-property Relationships
33%
Substrate Clamping
33%
Substrate Strain
100%
Switching Time
33%
Thick Film
33%
Trilayer
33%
Ultrafast
33%
Ultrasensitive
33%
Engineering
Coercive Field
50%
Crystalline Quality
50%
Dielectrics
50%
Engineering Strain
100%
Integrated Circuit
100%
Interlayer
100%
Nanoscale
50%
Nanosensor
50%
Phase Structure
50%
Released Membrane
50%
Room Temperature
50%
Strain State
50%
Switching Time
50%
Material Science
Capacitor
20%
Epitaxy
20%
Ferroelectric Material
100%
Film
20%
Materials Property
20%
Materials Structure
20%
Metal Oxide
40%
Oxide Compound
20%
Permittivity
20%
Silicon
20%
Thick Films
20%