Atomic layer defect-free etching for germanium using HBr neutral beam
Takuya Fujii, Daisuke Ohori, Shuichi Noda, Yosuke Tanimoto, Daisuke Sato, Hideyuki Kurihara, Wataru Mizubayashi, Kazuhiko Endo, Yi-Ming Li, Yao-Jen Lee, Takuya Ozaki, Seiji Samukawa*
*此作品的通信作者
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斯高帕斯(Scopus)