Atomic layer defect-free etching for germanium using HBr neutral beam

Takuya Fujii, Daisuke Ohori, Shuichi Noda, Yosuke Tanimoto, Daisuke Sato, Hideyuki Kurihara, Wataru Mizubayashi, Kazuhiko Endo, Yi-Ming Li, Yao-Jen Lee, Takuya Ozaki, Seiji Samukawa*

*此作品的通信作者

研究成果: Article同行評審

4 引文 斯高帕斯(Scopus)

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Keyphrases

Engineering

Material Science