Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology

Po-Tsun Liu*, T. C. Chang, Z. W. Lin, T. M. Tsai, C. W. Chen, B. C. Chen, J. K. Lee, Grace Chen, Eric Tsai, Joe Chang

*此作品的通信作者

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

摘要

In this paper, a direct patterning technology of non-photosensitive silicate based hydrogen silsesquioxane was investigated with electron beam lithography for IMD applications.

原文English
主出版物標題Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
發行者Institute of Electrical and Electronics Engineers Inc.
頁面110
頁數1
ISBN(電子)4891140402, 9784891140403
DOIs
出版狀態Published - 2003
事件International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
持續時間: 29 10月 200331 10月 2003

出版系列

名字Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

ConferenceInternational Microprocesses and Nanotechnology Conference, MNC 2003
國家/地區Japan
城市Tokyo
期間29/10/0331/10/03

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