Annealing effect of scratch characteristics of ZnMgO epilayers on R-plane sapphire

Hua Chiang Wen, Ming Chu Hsieh, Yu Pin Lan, Wu Ching Chou

    研究成果: Article同行評審

    摘要

    The nanotribological properties of Zn0.75Mg0.25O grown on R-plane sapphire using metal-organic vapor-phase epitaxy at different substrate temperatures (RT, 600, 700 and 800 °C) were investigated. A slight sliding track was observed at ramped loads of 250 μN, and an obvious bulge edge surrounding the groove was observed at ramped loads of 1 000 μN. Because of the annealing treatment, all the Zn0.75Mg0.25O coatings showed a reconstruction phenomenon of crystallites. The volumes of the bulge edges were as high as 30% in the annealed specimens and were larger than the volumes of the RT-treated specimens when ramped loads of 1 000 μN were applied. Under frictional loading, atomic force microscopy examination of scratch-tested films indicated lower bonding forces on R-plane sapphire than M-plane sapphire.

    原文English
    頁(從 - 到)158-163
    頁數6
    期刊International Journal of Materials Research
    112
    發行號2
    DOIs
    出版狀態Published - 1 二月 2021

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