Anchoring energy enhancement for plasma alignment technology

Chih Yi Hsu; Tse Hsien Lee; Huang-Ming Chen; Hui Chien J. Kuo; Yi Fan Chen; Chin Yang Lee; Yin Chang Lin; Yao Jane Hsu

doi:10.1889/1.3256636

Anchoring energy enhancement for plasma alignment technology

Chih Yi Hsu, Tse Hsien Lee, Huang-Ming Chen, Hui Chien J. Kuo, Yi Fan Chen, Chin Yang Lee, Yin Chang Lin, Yao Jane Hsu

光電工程學系

研究成果: Conference article › 同行評審

摘要

The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

原文	American English
頁（從 - 到）	1634-1636
頁數	3
期刊	Digest of Technical Papers - SID International Symposium
卷	40
發行號	1
DOIs	https://doi.org/10.1889/1.3256636
出版狀態	Published - 2009
事件	2009 Vehicles and Photons Symposium - Dearborn, MI, 美國持續時間: 15 10月 2009 → 16 10月 2009

存取文件

10.1889/1.3256636

其它文件與鏈接

Link to publication in Scopus

引用此

@article{910469d7316a41a59cadaa77996cb7f6,

title = "Anchoring energy enhancement for plasma alignment technology",

abstract = "The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell{\textquoteright}s EO properties by new plasma treatment were comparable to the rubbed PI surface.",

author = "Hsu, {Chih Yi} and Lee, {Tse Hsien} and Huang-Ming Chen and Kuo, {Hui Chien J.} and Chen, {Yi Fan} and Lee, {Chin Yang} and Lin, {Yin Chang} and Hsu, {Yao Jane}",

note = "Publisher Copyright: {\textcopyright} 2009 SID.; 2009 Vehicles and Photons Symposium ; Conference date: 15-10-2009 Through 16-10-2009",

year = "2009",

doi = "10.1889/1.3256636",

language = "American English",

volume = "40",

pages = "1634--1636",

journal = "Digest of Technical Papers - SID International Symposium",

issn = "0097-966X",

publisher = "John Wiley and Sons Inc.",

number = "1",

}

TY - JOUR

T1 - Anchoring energy enhancement for plasma alignment technology

AU - Hsu, Chih Yi

AU - Lee, Tse Hsien

AU - Chen, Huang-Ming

AU - Kuo, Hui Chien J.

AU - Chen, Yi Fan

AU - Lee, Chin Yang

AU - Lin, Yin Chang

AU - Hsu, Yao Jane

PY - 2009

Y1 - 2009

N2 - The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

AB - The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

UR - http://www.scopus.com/inward/record.url?scp=85072109534&partnerID=8YFLogxK

U2 - 10.1889/1.3256636

DO - 10.1889/1.3256636

M3 - Conference article

AN - SCOPUS:85072109534

SN - 0097-966X

VL - 40

SP - 1634

EP - 1636

JO - Digest of Technical Papers - SID International Symposium

JF - Digest of Technical Papers - SID International Symposium

IS - 1

T2 - 2009 Vehicles and Photons Symposium

Y2 - 15 October 2009 through 16 October 2009

ER -

Anchoring energy enhancement for plasma alignment technology

摘要

存取文件

其它文件與鏈接

指紋

引用此