Anchoring energy enhancement for plasma alignment technology

Chih Yi Hsu, Tse Hsien Lee, Huang-Ming Chen, Hui Chien J. Kuo, Yi Fan Chen, Chin Yang Lee, Yin Chang Lin, Yao Jane Hsu

研究成果: Conference article同行評審


The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

原文American English
頁(從 - 到)1634-1636
期刊Digest of Technical Papers - SID International Symposium
出版狀態Published - 1 1月 2009
事件2009 Vehicles and Photons Symposium - Dearborn, MI, United States
持續時間: 15 10月 200916 10月 2009


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