Analysis and modeling of skin and proximity effects for millimeter-wave inductors design in nanoscale Si CMOS

Ren Jia Chan, Jyh-Chyurn Guo

研究成果: Conference contribution同行評審

13 引文 斯高帕斯(Scopus)

摘要

Analytical models of skin effect and proximity effect were developed in this paper to calculate and predict the frequency dependent resistance, Re(Zin) and Q for mm-wave inductor design. The derived models incorporate layout and material parameters, and frequency in an explicit form suitable for circuit simulation. The accuracy has been proven by a close match with Re(Zin) and Q measured from mm-wave inductor (Ldc∼150pH, Qmax ∼17, fSR>>65GHz) fabricated by 65nm CMOS process with 0.9μm standard top metal.

原文English
主出版物標題European Microwave Week 2014
主出版物子標題"Connecting the Future", EuMW 2014 - Conference Proceedings; EuMIC 2014: 9th European Microwave Integrated Circuits Conference
發行者Institute of Electrical and Electronics Engineers Inc.
頁面13-16
頁數4
ISBN(電子)9782874870361
DOIs
出版狀態Published - 23 12月 2014
事件9th European Microwave Integrated Circuits Conference, EuMIC 2014 - Held as Part of the 17th European Microwave Week, EuMW 2014 - Rome, Italy
持續時間: 6 10月 20147 10月 2014

出版系列

名字European Microwave Week 2014: "Connecting the Future", EuMW 2014 - Conference Proceedings; EuMIC 2014: 9th European Microwave Integrated Circuits Conference

Conference

Conference9th European Microwave Integrated Circuits Conference, EuMIC 2014 - Held as Part of the 17th European Microwave Week, EuMW 2014
國家/地區Italy
城市Rome
期間6/10/147/10/14

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