Analysis and Design of InGaAs Negative-Capacitance FinFETs considering Quantum Capacitance

Shih En Huang, Shih Han Lin, Pin Su

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

摘要

This work analyzes and optimizes the design with emphasis on the inversion charge characteristics for InGaAs negative-capacitance FinFETs (NC-FinFETs) by using theoretical calculation corroborated with numerical simulation. Our study indicates that, optimized ferroelectric remnant-polarization (Pr) for InGaAs devices can be chosen by the capacitance matching at the optimized sub-band of the inversion capacitance. In addition, the optimized sub-band is different for the InGaAs devices with different fin-width. The Pr optimization of the InGaAs device is also different from the Si device. After the optimization, the quantum-capacitance induced inversion charge loss for InGaAs devices can be mitigated from ∼2.4X to ∼1.1X due to the action of negative capacitance.

原文English
主出版物標題2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
發行者Institute of Electrical and Electronics Engineers Inc.
頁面20-22
頁數3
ISBN(電子)9781538665084
DOIs
出版狀態Published - 3月 2019
事件2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, 新加坡
持續時間: 12 3月 201915 3月 2019

出版系列

名字2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Conference

Conference2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
國家/地區新加坡
城市Singapore
期間12/03/1915/03/19

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