An X-Ray Study of Domain Structure and Stress in Pd2Si Films at Pd-Si Interfaces

Haydn Chen; G. E. White; S. R. Stock; P. S. Ho

doi:10.1557/PROC-10-165

An X-Ray Study of Domain Structure and Stress in Pd2Si Films at Pd-Si Interfaces

Haydn Chen^*, G. E. White, S. R. Stock, P. S. Ho

^*此作品的通信作者

國際半導體產業學院

研究成果: Conference contribution › 同行評審

2 引文斯高帕斯（Scopus）

原文	English
主出版物標題	Materials Research Society Symposia Proceedings
發行者	North-Holland Publ Co
頁面	165-117
頁數	49
ISBN（列印）	0444007741
DOIs	https://doi.org/10.1557/PROC-10-165
出版狀態	Published - 1 12月 1982

出版系列

名字	Materials Research Society Symposia Proceedings
卷	10
ISSN（列印）	0272-9172

存取文件

10.1557/PROC-10-165

其它文件與鏈接

Link to publication in Scopus

引用此

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title = "An X-Ray Study of Domain Structure and Stress in Pd2Si Films at Pd-Si Interfaces",

author = "Haydn Chen and White, {G. E.} and Stock, {S. R.} and Ho, {P. S.}",

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PY - 1982/12/1

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M3 - Conference contribution

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BT - Materials Research Society Symposia Proceedings

PB - North-Holland Publ Co

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