An optimum design of the micromachined RF inductor

Jr Wei Lin*, C. C. Chen, J. K. Huang, Yu-Ting Cheng


研究成果: Paper同行評審

2 引文 斯高帕斯(Scopus)


With a complete performance investigation of the on-chip micromachined inductor with mechanical disturbances using ANSYS and HFSS simulators, an optimum structural design of the micromachined spiral inductors with fully CMOS compatible post-processes for RFIC applications is proposed in this paper. Via the incorporation of a sandwich dielectric membrane (0.7μm SiO 2 / 0.7μm Si 3 N 4 / 0.7μm TEOS) to enhance the structure rigidity, the inductor can have better signal stability. As compared, the new design of a 5nH micromachined inductor can have less 45% inductance variation than the conventional one while both devices operate at SGHz but with 10 m/sec 2 acceleration. Meanwhile, using a cross shape instead of blanket membrane can also effectively eliminate the inductance variation induced by the working temperature change (20°C to 75°C). It's our belief that the new micromachined inductors can have not only high Q performance but also better signal stability suitable for wide range RFIC applications.

出版狀態Published - 20 九月 2004
事件Digest of Papers - 2004 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Fort Worth, TX, United States
持續時間: 6 六月 20048 六月 2004


ConferenceDigest of Papers - 2004 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium
國家/地區United States
城市Fort Worth, TX


深入研究「An optimum design of the micromachined RF inductor」主題。共同形成了獨特的指紋。