An optimum design of the micromachined RF inductor

Jr Wei Lin*, C. C. Chen, J. K. Huang, Yu-Ting Cheng

*此作品的通信作者

研究成果: Paper同行評審

2 引文 斯高帕斯(Scopus)

摘要

With a complete performance investigation of the on-chip micromachined inductor with mechanical disturbances using ANSYS and HFSS simulators, an optimum structural design of the micromachined spiral inductors with fully CMOS compatible post-processes for RFIC applications is proposed in this paper. Via the incorporation of a sandwich dielectric membrane (0.7μm SiO 2 / 0.7μm Si 3 N 4 / 0.7μm TEOS) to enhance the structure rigidity, the inductor can have better signal stability. As compared, the new design of a 5nH micromachined inductor can have less 45% inductance variation than the conventional one while both devices operate at SGHz but with 10 m/sec 2 acceleration. Meanwhile, using a cross shape instead of blanket membrane can also effectively eliminate the inductance variation induced by the working temperature change (20°C to 75°C). It's our belief that the new micromachined inductors can have not only high Q performance but also better signal stability suitable for wide range RFIC applications.

原文English
頁面639-642
頁數4
出版狀態Published - 20 九月 2004
事件Digest of Papers - 2004 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Fort Worth, TX, United States
持續時間: 6 六月 20048 六月 2004

Conference

ConferenceDigest of Papers - 2004 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium
國家/地區United States
城市Fort Worth, TX
期間6/06/048/06/04

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