An Ensemble of Supervised Learning and Image Inpainting for Mura Detection

Chia Yu Lin*, Tzu Min Chang, Hao Yuan Chen, Tzer Jen Wei

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

Mura refers to surface defects or areas of uneven brightness that can occur during factory panel production. Mura can vary in size and shape and be categorized as 'light Mura' or 'serious Mura.' To optimize the repair process, factories aim to differentiate between the two types of Mura before sending the panels for repair. However, current Mura detection models focus only on identifying 'nrmal' and 'Mura,' resulting in poor performance in distinguishing between light and serious Mura. To address this issue, we propose an ensemble approach called the Ensemble Image Inpainting and Supervised Modeling Mura Detection System (EISMDS), which combines supervised and image inpainting models to differentiate between the two types of Mura. Experimental results show that our approach improves the True Positive Rate (TPR) by 11 % under a high True Negative Rate (TNR) compared to a single supervised detection model.

原文English
主出版物標題Proceedings - 2023 IEEE International Conference on Multimedia and Expo Workshops, ICMEW 2023
發行者Institute of Electrical and Electronics Engineers Inc.
頁面502-505
頁數4
ISBN(電子)9798350313154
DOIs
出版狀態Published - 2023
事件2023 IEEE International Conference on Multimedia and Expo Workshops, ICMEW 2023 - Brisbane, Australia
持續時間: 10 7月 202314 7月 2023

出版系列

名字Proceedings - 2023 IEEE International Conference on Multimedia and Expo Workshops, ICMEW 2023

Conference

Conference2023 IEEE International Conference on Multimedia and Expo Workshops, ICMEW 2023
國家/地區Australia
城市Brisbane
期間10/07/2314/07/23

指紋

深入研究「An Ensemble of Supervised Learning and Image Inpainting for Mura Detection」主題。共同形成了獨特的指紋。

引用此