TY - JOUR
T1 - An All-Region BSIM Thin-Film Transistor Model for Display and BEOL 3-D Integration Applications
AU - Pahwa, Girish
AU - Salahuddin, Sayeef
AU - Hu, Chenming
N1 - Publisher Copyright:
© 1963-2012 IEEE.
PY - 2024
Y1 - 2024
N2 - This article introduces a compact model for single-gate and multigate thin-film transistors (TFTs) based on the Berkeley short-channel IGFET model-common multiple gate (BSIM-CMG) framework, valid in all regions of TFT operation. We develop a model for the channel charge density, including the impact of traps in the amorphous/polycrystalline channel of TFT, based on a linear potential profile approximation along the gate-normal direction. We further develop explicit, charge-based compact models for current and terminal charges. Unlike previous models, this model implicitly includes the impact of trap-limited conduction mechanism. In addition, we include the impact of Schottky source/drain contact resistances and temperature dependencies. The model is carefully validated with published experimental data of TFTs using diverse channel materials, including oxide semiconductors (OSs) and poly-Si, and various geometries, spanning applications in displays and emerging 3-D back-end-of-line (BEOL) integration scenarios.
AB - This article introduces a compact model for single-gate and multigate thin-film transistors (TFTs) based on the Berkeley short-channel IGFET model-common multiple gate (BSIM-CMG) framework, valid in all regions of TFT operation. We develop a model for the channel charge density, including the impact of traps in the amorphous/polycrystalline channel of TFT, based on a linear potential profile approximation along the gate-normal direction. We further develop explicit, charge-based compact models for current and terminal charges. Unlike previous models, this model implicitly includes the impact of trap-limited conduction mechanism. In addition, we include the impact of Schottky source/drain contact resistances and temperature dependencies. The model is carefully validated with published experimental data of TFTs using diverse channel materials, including oxide semiconductors (OSs) and poly-Si, and various geometries, spanning applications in displays and emerging 3-D back-end-of-line (BEOL) integration scenarios.
KW - All-region compact model
KW - Berkeley short-channel IGFET model (BSIM)
KW - TFT
KW - back-end-of-line (BEOL) 3-D integration
KW - display thin-film transistor (TFT)
KW - field effect mobility
KW - oxide semiconductors (OSs) Schottky contact resistance
KW - trap limited conduction (TLC)
UR - https://www.scopus.com/pages/publications/85197093603
U2 - 10.1109/TED.2024.3416083
DO - 10.1109/TED.2024.3416083
M3 - Article
AN - SCOPUS:85197093603
SN - 0018-9383
VL - 71
SP - 4701
EP - 4709
JO - IEEE Transactions on Electron Devices
JF - IEEE Transactions on Electron Devices
IS - 8
ER -