摘要
High-performance amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) are successfully fabricated on a colorless polyimide substrate using a top-gate self-aligned structure. All thin films are deposited by roll-to-roll-compatible sputtering processes at room temperature. The maximum field-effect mobility is 18 cm 2V• s, the threshold voltage is-1.35 V, the subthreshold slope is 0.1 V/decade, and the on/off current ratio is about 10 5. The results highlight that excellent device performance can be realized in a-IGZO TFTs without compromising manufacturability.
原文 | English |
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文章編號 | 6071028 |
頁(從 - 到) | 47-49 |
頁數 | 3 |
期刊 | IEEE Electron Device Letters |
卷 | 33 |
發行號 | 1 |
DOIs | |
出版狀態 | Published - 1 1月 2012 |