Amorphous InGaZnO thin-film transistors compatible with roll-to-roll fabrication at room temperature

Ming Jiue Yu*, Yung Hui Yeh, Chun Cheng Cheng, Chang Yu Lin, Geng Tai Ho, Benjamin Chih Ming Lai, Chyi Ming Leu, Tuo-Hung Hou, Yi Jen Chan

*此作品的通信作者

    研究成果: Article同行評審

    50 引文 斯高帕斯(Scopus)

    摘要

    High-performance amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) are successfully fabricated on a colorless polyimide substrate using a top-gate self-aligned structure. All thin films are deposited by roll-to-roll-compatible sputtering processes at room temperature. The maximum field-effect mobility is 18 cm 2V• s, the threshold voltage is-1.35 V, the subthreshold slope is 0.1 V/decade, and the on/off current ratio is about 10 5. The results highlight that excellent device performance can be realized in a-IGZO TFTs without compromising manufacturability.

    原文English
    文章編號6071028
    頁(從 - 到)47-49
    頁數3
    期刊IEEE Electron Device Letters
    33
    發行號1
    DOIs
    出版狀態Published - 1 1月 2012

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