Advancements in single-crystal silicon with elevated-laser-liquid-phase-epitaxy (ELLPE) for monolithic 3D ICs

Bo Jheng Shih*, Yu Ming Pan, Hao Tung Chung, Nein Chih Lin, Chih Chao Yang, Po Tsang Huang, Huang Chung Cheng, Chang Hong Shen, Jia Min Shieh, Wen Fa Wu, Kuan Neng Chen, Chenming Hu

*此作品的通信作者

研究成果: Article同行評審

摘要

In this study, we present a low thermal budget elevated-laser-liquid-phase-epitaxy technique designed for the precise fabrication of single-crystal islands (SCIs) intended for use in middle-end-of-line (MEOL) FinFETs. Each of these SCIs features a (100) orientation tended from Si seeding structure and is successfully integrated as channel materials in the MEOL circuit of a monolithic 3D IC (3DIC). This technique effectively mitigates the typical performance disparities associated with poly-Si channel materials in upper tiers, addressing a significant challenge in advanced electronic device fabrication and potentially enhancing the performance and reliability of MEOL FinFETs in monolithic 3DIC.

原文English
文章編號04SP30
期刊Japanese journal of applied physics
63
發行號4
DOIs
出版狀態Published - 1 4月 2024

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