Advanced nano-devices produced by high-performance plasma etching processes

Seiji Samukawa

doi:10.2493/jjspe.73.993

Advanced nano-devices produced by high-performance plasma etching processes

Seiji Samukawa^*

^*此作品的通信作者

電信工程研究所

研究成果: Review article › 同行評審

原文	English
頁（從 - 到）	993-998
頁數	6
期刊	Journal of the Japan Society for Precision Engineering
卷	73
發行號	9
DOIs	https://doi.org/10.2493/jjspe.73.993
出版狀態	Published - 2007

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10.2493/jjspe.73.993

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引用此

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title = "Advanced nano-devices produced by high-performance plasma etching processes",

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