Advanced gate-all-around fin-like poly-si tfts with multiple nanowire channels

The gate-all-around (GAA) fin-like poly-Si TFTs (FinTFTs) with multiple nanowire channels (MNCs) have been fabricated using a simple process to demonstrate high performance electrical characteristics. The fin-like nanowire (NW) channel with high body thickness-to-width ratio (T _Fin /W _Fin ), approximately equals to one, was realized only with a sidewall-spacer formation. The unique suspending MNCs were also achieved to build the GAA structure. By the way, the GAA-MNC FinTFTs showed outstanding three-dimensional gate controllability and excellent electrical characteristics, which revealed a high ON/OFF current ratio (≥10 ⁸ ), a low threshold voltage, a steep subthreshold swing, a near-free drain-induced barrier lowering and a good reliability. Therefore, such the high-performance GAA-MNC FinTFTs are very suitable for the applications in the system-on-panel (SOP) and three-dimensional (3D) circuits.