摘要
We report an efficient p-type doping of NPB layer using WO3 as a p-dopant. We find that increasing the WO3 volume percentage can reduce the activation energy of the NPB layer and increase the hole concentration in NPB layer. As a result, the hole-injection can be improved via tunneling through a narrow depletion region due to the increasing band bending which corresponds to the difference of Fermi level position between the ITO and the NPB layer.
原文 | English |
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頁面 | 1315-1318 |
頁數 | 4 |
出版狀態 | Published - 12月 2006 |
事件 | 13th International Display Workshops, IDW '06 - Otsu, 日本 持續時間: 6 12月 2006 → 6 12月 2006 |
Conference
Conference | 13th International Display Workshops, IDW '06 |
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國家/地區 | 日本 |
城市 | Otsu |
期間 | 6/12/06 → 6/12/06 |